This is the first book to address the optimization of resolution enhancement techniques (RET) in optical lithography. It provides an in-depth discussion of RET tools?which use model-based mathematical optimization approaches. The book startswith an introduction of optical lithography systems, electric magnetic field principles, and fundamentals of optimization. Based on this preliminary knowledge, the book goes on to describe algorithms?fpr the development of?optimal optical proximity correction (OPC), phaseshifting mask (PSM), offaxis illumination (OAI) approaches, and their combinations. Algorithms for coherent illumination as well as partially coherent illumination systems are described.?This book includes mathematical derivations and?MATLAB software files, allowing the reader to quickly apply any of the optimization algorithms described in the book, and to design a set of optimal lithography masks. An accompanying MATLAB software guide is also included.
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